合金溅射靶材形状: 方板, 箔片, 圆盘状, 棒状, 环状等等
合金溅射靶材纯度: 99%至99.999%
合金溅射靶材规格: 直径最大<300mm, 长<1000mm x 宽<300mm
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Aluminum (Al)-铝 合金溅射靶材: Al-Ag, Al-Cu, Al-Si, Al-Si-Cu, Al-Ni, Al-Mg, Al-Nd, Al-Cr, Al-Hf, Al-Sc, Al-Ti
Antimony (Sb)-锑 合金溅射靶材: In-Sb alloy e.t.c
Bismuth (Bi) -铋 合金溅射靶材 : Bi-Sn, Bi-Fe alloy e.t.c
Boron (B) - 硼 合金溅射靶材: B-Fe, B-W, B-Hf, B-V e.t.c
Cobalt (Co) - 钴 合金溅射靶材: Co-Fe, Co-Fe-Si, Co-Sm, Co-Ni, Co-Cr e.t.c
Cerium (Ce) - 铈 合金溅射靶材: Ce-Gd e.t.c
Copper (Cu) - 铜 合金溅射靶材: Cu-Al, Cu-Ag, Cu-Mg e.t.c
Chromium (Cr) - 铬 合金溅射靶材: Cr-Fe, Cr-Ni, Cr-Al e.t.c
Dysprosium (Dy) - 镝 合金溅射靶材: Dy-Fe, Dy-Tb-Fe e.t.c
Gadolinium (Gd) -钆 合金溅射靶材: Gd-Fe, Gd-Mg alloy e.t.c
Germanium (Ge) - 锗 合金溅射靶材: Ge-Te alloy e.t.c
Hafnium (Hf) -铪 合金溅射靶材: Hf-Al, Hf-Fe, Hf-Y alloy e.t.c
Holium (Ho) -钬 合金溅射靶材: Ho-Cu alloy e.t.c
Indium (In) -铟 合金溅射靶材: In-Sn, In-Zn, In-Sb alloy e.t.c
Iron (Fe) -铁 合金溅射靶材: Fe-Co alloy e.t.c
Magnesium (Mg) -镁 合金溅射靶材: Mg-Cu, Mg-Al e.t.c
Manganese (Mn) -锰 合金溅射靶材: Mn-Fe alloy e.t.c
Molybdenum (Mo) - 钼 合金溅射靶材: Mo-Al, Mo-Nb, Mo-V, Mo-Ta, Mo-W alloy e.t.c
Neodymium (Nd) - 钕合金溅射靶材: Nd-Al, Pr-Nd, Nd-Ag alloy e.t.c
Niobium (Nb) -铌合金溅射靶材: Nb-Ta, Nb-Ti, Nb-Mo alloy e.t.c
Nickel (Ni) -镍合金溅射靶材: Ni-Cr, Ni-Ti, Ni-Fe, Ni-Mn, Ni-Al, Ni-V alloy e.t.c
Praseodymium (Pr) -镨合金溅射靶材: Pr-Nd alloy alloy e.t.c
Scandium (Sc) -钪合金溅射靶材: Sc-Al alloy alloy e.t.c
Silicon (Si) -硅合金溅射靶材: Si-Al alloy alloy e.t.c
Samarium (Sm) -钐合金溅射靶材: Sm-Co, Sm-Fe alloy e.t.c
Silver (Ag) -银合金溅射靶材: Ag-Cu, Ag-Al alloy e.t.c
Tantalum (Ta) -钽合金溅射靶材: Ta-Nb, Ta-Al, Ta-W alloy e.t.c
Terbium (Tb) -铽合金溅射靶材: Tb-Dy-Fe, Tb-Dy, Tb-Fe alloy e.t.c
Titanium (Ti) -钛合金溅射靶材: Ti-Ni, Ti-Nd, Ti-Al, Ti-W alloy e.t.c
Tin (Sn) -锡合金溅射靶材: Sn-Zn e.t.c
Vanadium (V) -钒合金溅射靶材: V-W, V-Fe, Ni-V alloy e.t.c
Tungsten (W) -钨合金溅射靶材: W-Ti, W-B, W-Al, W-Ta alloy e.t.c
Yttrium (Y) -钇合金溅射靶材: Y-Al, Y-Hf, Y-Zr alloy e.t.c
Zirconium (Zr) -锆合金溅射靶材: Zr-Y, Zr-Al alloy e.t.c
Zinc (Zn) -锌合金溅射靶材: Zn-Mg, Zn-Mg-Cu, Zn-Al alloy e.t.c
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