Chromium Carbide sputtering targets (Cr2C3, CrC) 碳化铬溅射靶材, 纯度: 99.5%, shape as plate, disc. 

Hafnium Carbide sputtering targets (HfC) 碳化铪, Purity: 99.5%, shape as plate, disc. 

Niobium Carbide sputtering targets (NbC) 碳化铌, Purity: 99.5%, shape as plate, disc. 

Silicon Carbide sputtering targets (SiC) 碳化硅, Purity: 99.5%, shape as plate, disc. 

Titanium Carbide sputtering targets (TiC) 碳化钛, Purity: 99.5%, shape as plate, disc. 

Tantalum Carbide sputtering targets (TaC) 碳化钽, Purity: 99.5%, shape as plate, disc. 

Tungsten Carbide sputtering targets (WC) 碳化钨, Purity: 99.5%, shape as plate, disc. 

Vanadium Carbide sputtering targets (VC) 碳化钒, Purity: 99.5%, shape as plate, disc. 

Zirconium Carbide sputtering targets (ZrC) 碳化锆, Purity: 99.5%, shape as plate, disc. 

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