Chromium Carbide sputtering targets (Cr2C3, CrC) 碳化鉻濺射靶材, 純度: 99.5%, shape as plate, disc. 

Hafnium Carbide sputtering targets (HfC) 碳化鉿, Purity: 99.5%, shape as plate, disc. 

Niobium Carbide sputtering targets (NbC) 碳化鈮, Purity: 99.5%, shape as plate, disc. 

Silicon Carbide sputtering targets (SiC) 碳化硅, Purity: 99.5%, shape as plate, disc. 

Titanium Carbide sputtering targets (TiC) 碳化鈦, Purity: 99.5%, shape as plate, disc. 

Tantalum Carbide sputtering targets (TaC) 碳化鉭, Purity: 99.5%, shape as plate, disc. 

Tungsten Carbide sputtering targets (WC) 碳化鎢, Purity: 99.5%, shape as plate, disc. 

Vanadium Carbide sputtering targets (VC) 碳化釩, Purity: 99.5%, shape as plate, disc. 

Zirconium Carbide sputtering targets (ZrC) 碳化鋯, Purity: 99.5%, shape as plate, disc. 

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