Hafnium nitride HfN sputtering targets use in thin film coating CAS 25817-87-2

Hafnium nitride HfN sputtering targets use in thin film coating CAS 25817-87-2

Model No.︰HfN

Brand Name︰TYR

Country of Origin︰China

Unit Price︰US $ 200 / pc

Minimum Order︰1 pc

Inquire Now

Product Description


Hafnium nitride, HfN ceramic sputtering target

Purity: 99.5%

Size: Diameter: 355.6mm (14") max.

Single piece Size: Length: <350mm, Width: <250mm, Thickness: >1mm,

if larger size than this, we can do it as Tiles joint by 45 degree or 90 degree


Shape: discs, plate, rod, tube, sheet, Delta, Rotatable and per drawing

 

density: 13.8g/cm3
melting point of 3310 °C.


Hafnium nitride (HfN) is the most refractory of all known metal nitrides, with aThis has led to proposals that hafnium or its carbides might be useful as construction materials that are subjected to very high temperatures. The mixed carbide tantalum hafnium carbide (Ta4HfC5) possesses the highest melting point of any currently known compound, 4215 °C.
 

 

We also supplying other nitride targets material as following:

 

Aluminum Nitride , AlN target

Boron Nitride, BN target

Hafnium Nitride, HfN target

Niobium Niride , NbN target

Silicom Nitride , Si3N4 target

Tantalum Nitride , TaN target

Titanium Carbon nitride , TiCN target

Titanium Nitride, TiN target

​Tungsten Nitride, WN targets

Vanadium Nitride , VN target

Zirconium Nitride , ZrN target

specification︰ Hafnium nitride, HfN ceramic sputtering target, evaporation or thin film coating material, HfN powder

Label︰ Hafnium nitride HfN sputtering targets