Product Description

Niobium Niride (NbN) Ceramic sputtering target, NbN powder, NbN evaporation or thin film coating material

Powder：-625mesh, -325mesh，-200mesh，-160mesth, -100mesh e.t.c particle size

Sputtering Targets : Diameter: 355.6mm (14") max. Single piece Size: Length: <254mm, Width: <127mm, Thickness: >1mm, if larger size than this, we can do it as Tiles joint by 45 degree or 90 degree

Evaporation Material：Pieces: 1-4mm, 1-6mm, 3-6mm, 3-12mm e.t.c,  Tablets: 8-9mm dia. X 4-5mm thick, 10mm dia. X 10mm thick e.t.c

Shape: discs, plate, rod, tube, sheet, Delta, Rotatable and per drawing

Nitride Ceramic sputtering target 

Aluminum Nitride , AlN target                       Boron Nitride, BN target    

Niobium Niride , NbN target       

Silicom Nitride , Si3N4 target                        Tantalum Nitride , TaN target       

Titanium Carbon nitride , TiCN target                 Titanium Nitride, TiN target      

Vanadium Nitride , VN target                        

 

TYR material supply all kinds of ceramic sputtering target , compound semiconductor target include Oxide sputtering target , Fluoride sputtering target , Boride sputtering target , Carbide sputtering target , Nitride sputtering target , Sulfide sputtering target , Selenide sputtering target , Silicide sputtering target , Telluride sputtering target , Antimonide sputtering target , Arsenide sputtering target ......

The available made method include hot pressing , HP, , hot/cold isostatic pressing , HIP, CIP, , and vacuum melting, vacuum sintering

TYR will base on each different material to select the best way to made it and sure the finish ceramic sputtering target to be best.

specification︰ Niobium Niride (NbN) Ceramic sputtering target, NbN powder, NbN evaporation or thin film coating material