Aluminum Nickel (Al-Ni) alloy sputtering targets CAS 7429-90-5 and 7440-02-0
Product Description
Aluminum Nickel (Al-Ni) alloy sputtering targets use in evaporation or thin film coating
purity: 99.9%
Composition: Al/Ni=3/1at and Al/Ni=1/1at or made by request
Size: max. 355.6mm (14 inch) ,
Length: 500mm max x Width 200mm x thickness 20mm max.,
Shape: Discs, disks, rod, step disk, delta, plate, sheets or made per drawing
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specification︰
purity: 99.9%
Composition: Al/Ni=3/1at and Al/Ni=1/1at or made by request
Size: max. 355.6mm (14 inch) ,
Length: 500mm max x Width 200mm x thickness 20mm max.,
Shape: Discs, disks, rod, step disk, delta, plate, sheets or made per drawing
Composition: Al/Ni=3/1at and Al/Ni=1/1at or made by request
Size: max. 355.6mm (14 inch) ,
Length: 500mm max x Width 200mm x thickness 20mm max.,
Shape: Discs, disks, rod, step disk, delta, plate, sheets or made per drawing
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