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Product Catalog

• Sputtering Targets
• Metal Targets
• Calcium Ca sputtering targets use in thin film coating CAS 7440-70-2
• Zirconium Zr sputteirng target usd in Decorate thin film coating CAS 7440-67-7
• Titanium (Ti) Target use in DC sputtering CAS 7440-32-6
• Tin (Sn) metal sputtering target, purity: 99.99%, 99.999%, CAS: 7440-31-5
• Vanadium V metal sputtering targets CAS 7440-62-2
• Niobium (Nb) metal sputtering target use in planner display thin film coating
• Manganese (Mn) sputtering targets use in Glass thin film coating CAS: 7439-96-5
• Indium (In) sputtering targets CAS 7440-74-6
• Graphite (C) targets use in thin film coating CAS 7782-42-5
• Tungsten (W) metal targets use in Planne display thin film coating CAS 7440-33-7
• Tellurium (Te) targets use in solar cell thin film coating CAS 13494-80-9
• Selenium (Se) sputtering targets, purity: 99.99%, CAS: 7782-49-82
• Rhenium (Re) sputtering targets CAS 7440-15-5
• Nickel (Ni) metal sputtering targets, Purity: 99.995%, CAS: 7440-02-0
• Molybdenum (Mo) metal sputtering targets, Purity: 99.95%, CAS: 7439-98-7
• Chromium (Cr) metal sputtering targets CAS: 7440-47-3
• Cobalt Co sputtering targets use in thin film coating CAS 7440-48-4
• Bismuth (Bi) metal sputtering targets, purity; 99.99%, CAS: 7440-69-9
• Boron (B) sputtering targets, Purity: 99.9%, CAS ID: 7440-42-8
• Ruthenium (Ru) metal sputtering targets, Purity: 99.95%, CAS: 7440-18-8
• Antimony (Sb) metal sputtering targets, Purity: 99.99%, CAS: 7440-36-0
• Aluminum (Al) metal sputtering targets CAS: 7429-90-5
• Silicon (Si) polycrystal, monocrystal sputtering targets CAS 7440-21-3
• Tantalum,Ta sputtering targets for plaane display thin film coating
• Alloy Targets
• Palladium Copper Pd-Cu alloy sputtering targets
• Molybdenum Silicon Mo-Si alloy sputtering targets
• Molybdenum Sodium Mo-Na alloy sputtering targets
• Nickel-Vanadium (NiV) alloy targets use in evaporation or thin film coating
• Aluminum Nickel (Al-Ni) alloy sputtering targets CAS 7429-90-5 and 7440-02-0
• Vanadium Aluminum (V-Al) alloy targets use in evaporation or thin film coating
• Nickel-Chromium (NiCr) alloy targets use in evaporation or thin film coating
• Tungsten Titanium (WTi) alloy sputtering targets
• Titanium Aluminium (Ti-Al) Sputtering targets
• Oxide Targets
• Silver Oxide Ag2O sputtering targets CAS 20667-12-3
• Nickel oxide NiO sputtering targets CAS: 1313-99-1
• Vanadium oxide (V2O5, VO2) sputtering targets, CAS: 1314-62-1
• Zinc Oxide (ZnO) sputtering targets, Purity: 99.99%, CAS: 1314-13-2
• Zirconium oxide (ZrO2) sputtering targets, purity: 99.95%, CAS: 1314-23-4
• Titanium trioxide (Ti2O3) sputtering targets, purity: 99.99%, CAS: 1344-54-3
• Titanium oxide (TiO2) sputtering targets, purity: 99.99%, CAS: 13463-67-7
• Titanium monoxide TiO sputtering targets use in RF sputtering CAS 12137-20-1
• Tin oxide (SnO2, SnO) sputtering targets, purity: 99.9%, CAS: 18282-20-5
• Silicon dioxide (SiO2) targets use in thin film coating CAS 60676-86-0
• Silicon monoxide (SiO) target use in thin film coating CAS 10097-28-6
• Molybdenum trioxide (MoO3) target use in thin film coating CAS 1313-27-5
• Iron oxide (Fe3O4, Fe2O3) targets use in thin film coating CAS 1332-37-2
• Cuprous Oxide (Cu2O, CuO) targets CAS 1317-39-1 and 1317-38-0
• Cobalt oxide (Co3O4) target use in thin film coating CAS 1308-06-01
• Aluminum oxide (Al2O3) sputtering target use in thin film coating CAS 1344-28-1
• Niobium penoxide (Nb2O5, Nb2Ox) sputtering target CAS 1313-96-8
• Hafnium oxide (HfO2) sputtering target CAS 12055-23-1
• Tantalum pentoxide (Ta2O5) sputtering targets CAS 1314-61-0
• Tungsten oxide (WO3,WO2.9) sputtering targets, Purity: 99.95%, CAS 1314-35-8
• Lithium Oxide Li2O powder CAS 12057-24-8 battery material
• Indium oxide (In2O3) sputtering target use in thin film coating CAS 1312-43-2
• Silicide Targets
• Zirconium disilicide ZrSi2 sputtering targets CAS 12039-90-6
• Tungsten Disilicide WSi2 sputtering targets CAS12039-88-2
• Titanium silicide TiSi2 sputtering targets CAS 12039-83-7
• Chromium Sillicide (CrSi2) ceramic sputtering target
• Tatanlum silicide (Ta3Si5, TaSi2) ceramic sputtering target
• Sulfide Targets
• Titanium sulfide TiS2 sputtering target use in thin film coating CAS 12039-13-3
• Cadmium sulfide CdS sputtering targets use in solar cell coating CAS 1306-23-6
• Tin(IV) sulfide SnS2 sputtering targets CAS1315-01-1
• Tungsten Sulfide WS2 sputtering targets use in thin film coating CAS 12138-09-9
• Zinc sulfide ZnS sputtering targets use in thin film coating CAS 1314-98-3
• Molybdenum sulfide MoS2 sputtering target use in thin film coating CAS 1317-33-5
• Fluoride Targets
• Aluminium fluoride AlF3 sputtering targets CAS 7784-18-1
• Magnium Fluoride MgF2 sputtering targets CAS 7783-40-6
• Nitride Targets
• Zirconium Nitride ZrN sputtering targets use in thin film coating CAS 25658-42-8
• Silicon Nitride Si3N4 sputtering targets use in thin film coating CAS 12033-89-5
• Hafnium nitride HfN sputtering targets use in thin film coating CAS 25817-87-2
• Cuprous nitride (Cu3N) sputtering target
• Boron nitride (BN) sputtering target CAS 10043-11-5
• Aluminum Nitrite (AlN) sputtering target use in thin film coating CAS 24304-00-5
• Tantalum nitride TaN sputtering targets CAS 12033-62-4
• Titanium nitride TiN sputtering targets CAS 25583-20-4
• Boride Targets
• Titanium diboride TiB2 targets use in RF sputtering CAS 12045-63-5
• Tantalum boride (TaB2) ceramic target
• Zirconium boride ZrB2 sputtering targets CAS 12045-14-6
• Tungsten boride (WB) sputtering target
• Carbide Targets
• Zirconium Carbide (ZrC) Sputtering targets use in evaporation CAS 12070-14-3
• Titanium Carbide TiC sputtering targets CAS 12070-08-5
• Silicon carbide (SiC) targets CAS 409-21-2
• Vanadium carbide VC sputtering targets use in thin film coating CAS: 12070-10-9
• Niobium carbide NbC Sputtering targets use in thin film coating CAS 12069-94-2
• Molybdenum carbide (Mo2C) target CAS 12069-89-5
• Hafnium Carbide HfC sputtering targets use in thin film caoting CAS:12069-85-1
• Boron carbide (B4C) Sputtering target CAS 12069-32-8
• Tatanlum carbide TaC sputtering target use in thin film coating CAS 12070-06-3
• Tungsten carbide WC targets use in RF sputtering CAS 12070-12-1
• Compound targets
• Bismuth Dysprosium Iron Gallium Oxide BiDyFeGaO12 sputtering targets
• Yttria-stabilized zirconia Y2O3-ZrO2 YSZ sputtering targets CAS 64417-98-7
• Strontium Ruthanate SrRuO3 Sr2RuO4 Sputtering targets
• Indium Gallium Zinc Oxide, In2O3-Ga2O3-ZnO (IGZO) sputtering targets
• Lithium phosphate hemihydrate,Li3PO4 sputtering targets
• Barium titanate BaTiO3 sputtering target CAS: 12047-27-7 
• Barium Strontium Titanate (BaSrTiO3) sputtering targets use in thin film coating
• Copper tin oxide (Cu2SnO4) targets use in thin film coating
• Barium Zirconium Yttrium Oxide (BaZrYO3) sputtering targets
• Aluminum Zinc oxide (AZO) sputtering targets CAS 1314-13-2 and and 1344-28-1 
• Tungsten oxide doped Lithium (WO3-Li) sputtering targets
• Neodymium Manganese Strontium NdMnSrO sputtering targets
• Indium Tin oxide (In2O3-SnO2) ITO sputtering target CAS 50926-11-9
• Selenide targets
• Cadmium Selenide CdSe granules, powders use in semiconductor CAS 1306-24-7
• Zirconium selenide ZrSe2 sputtering targets CAS 12166-47-1
• Tungsten Selenide WSe2 compound semiconduct material
• Cadmium Selenide CdSe sputtering targets CAS 1306-24-7

• Thin Film Coating Material
• Antimony trisulfide Sb2S3 granules use in semiconductor CAS 1345-04-6
• CVD Zinc Selenide ZnSe crystal granules use in optical coating
• Tin(IV) sulfide SnS2 granules CAS1315-01-1
• Tin(II) sulfide SnS granules CAS 1314-95-0
• Molybdenum trioxide MoO3 granules use in thin film coating CAS 1313-27-5
• Tungsten (W) metal evaporation material use in thin film coating CAS 7440-33-7
• Zirconium oxide ZrO2 evaporation or thin film coating material CAS: 1314-23-4
• Aluminum (Al) metal evaporation material CAS 7429-90-5
• Titanium oxide Ti3O5 granules use in thin film coating CAS 12065-65-5
• Magnesium oxide (MgO) crystal granules optics coating material CAS:1309-48-4
• Aluminum oxide (Al2O3) optical thin film coating material, CAS 1344-28-1
• Aluminum Floride (AlF3) optical thin film coating material CAS 7784-18-1
• Calcium Fluoride (CaF2) optical thin film coating material, CAS ID 7789-75-5
• Barium fluoride (BaF2) optical thin film coating material CAS 7787-32-8
• Lithium Fluoride (LiF) optical thin film coating material, CAS 7789-24-4
• Magnesium fluoride, MgF2 crystal granules optics coating material CAS 7783-40-6

• Compound Semiconductor Material
• Sulfur or Sulphur (S) chunks, powder CAS 7704-34-9
• Antimony Telluride Sb2Te3 targets CAS 1327-50-0
• Tin Arsenide SnAs granules CAS 39332-13-3
• Tin Telluride SnTe granules use in thermoelectric generator CAS 120404-02-7
• Tin Telluride SnTe targets use in thermoelectric generator CAS 120404-02-7
• Silver sulfide Ag2S granules CAS 21548-73-2
• Yttrium Barium Copper Oxide YBaCuOx supper conduction sputtring targets
• Bismuth Telluride Bi2Te3 crystal CAS 1304-82-1
• Bismuth Selenide Bi2Se3 granules, powders use in semiconductor CAS 12068-69-8
• Bismuth(III) sulfide Bi2S3 granules CAS 1345-07-9
• Zinc Telluride ZnTe sputtering targets use in Optoelectronics CAS 1315-11-3
• Lead selenide PbSe granules use in thin film coating CAS 12069-00-0
• Gadolinium Barium Copper Oxide GdBaCuO supperconduction sputtring targets
• Cadmium Telluride CdTe sputtering targets use in thin film coating CAS 1306-25-8
• Iron phosphide Fe3P, FeP granules CAS 12023-53-9

• Chemical material
• Titanium sulfide TiS2 powder
• Cesium Tungstate (Cs2WO4) Powder,Purity: 99.9%, CAS 13587-19-4
• Rubidium Chloride (RbCl) powder CAS ID 7791-11-9
• Rubidium carbonate Rb2CO3 CAS 584-09-8
• Tellurium Dioxide (TeO2) white powder, DVD grade 99.999% purity, CAS 7446-07-3
• Niobium nitride (NbN) ceramic sputtering target