Indium oxide (In2O3) sputtering target use in thin film coating CAS 1312-43-2

Indium Oxide, In2O3 sputtering targets

Purity: 99.99%

Shape: Discs, disks, step disk, delta, plate, sheets or made per drawing

Diameter: 355.6mm (14") max.

Single piece Size: Length: <500mm, Width: <250mm, Thickness: >1mm, if larger size than this, we can do it as Tiles joint by 45 degree or 90 degree

Made sputtering targets method: hot pressing (HP), hot/cold isostatic pressing (HIP, CIP), and vacuum melting, vacuum sintering

Applications:

Indium oxide is used in some types of batteries, thin film infrared reflectors transparent for visible light (hot mirrors), some optical coatings, and some antistatic coatings. In combination with tin dioxide, indium oxide forms indium tin oxide (also called tin doped indium oxide or ITO), a material used for transparent conductive coatings.

In semiconductors, indium oxide can be used as an n-type semiconductor used as a resistive element in integrated circuits.

In histology, indium oxide is used as a part of some stain formulations.

We have only listed the more popular material. Please feel free contact us with any special requirements at any times, we will try to get back for you ASAP.